Texas Instruments

REF5050IDR

Voltage Reference

Manufacturer
MPN
REF5050IDR
Product Type
Package / Case
SOIC-8
Key Attributes
Low-noise, extremely low temperature drift, wide Vn precision voltage reference

Technical Specifications

TypeDescription
Output TypeFixed
Output Voltage5 V
Output Current0.01 A
Working Voltage V11.6 V
Tolerance0.05 %
Iq A0.001 A
Minimum Cathode Current for Regulation-
TypeDescription
Reference TypeSeries
Noise - 1/10Hz to 10Hz15uVp-p
Noise - 10Hz to 10kHz-
Operating Temp-40°C ~ +125°C
FeaturesEnable/disable;Built-in temperature sensor
Package / CaseSOIC-8

Product Introduction

The REF50xx is a family of low-noise, low-drift, very high precision voltage references. These references are capable of both sinking and sourcing, and are very robust with regard to line and load changes.

Excellent temperature drift (3ppm/°C) and high accuracy (0.05%) are achieved using proprietary design techniques. These features, combined with very low noise, make the REF50xx family ideal for use in high-precision data acquisition systems.

Each reference voltage is available in both standard and high-grade versions. They are offered in MSOP-8 and SO-8 packages, and are specified from -40°C to +125°C.

Features

  • LOW TEMPERATURE DRIFT:
  • High-Grade: 3ppm/°C (max)
  • Standard-Grade: 8ppm/°C (max)
  • HIGH ACCURACY:
  • High-Grade: 0.05% (max)
  • Standard-Grade: 0.1% (max)
  • LOW NOISE: 3μVPP/V
  • EXCELLENT LONG-TERM STABILITY:
  • 45ppm/1000hr (typ) after 1000 hours
  • HIGH OUTPUT CURRENT: ±10mA
  • TEMPERATURE RANGE: -40°C to +125°C

Applications

  • - 16-BIT DATA ACQUISITION SYSTEMS ATE EQUIPMENT - INDUSTRIAL PROCESS CONTROL - MEDICAL INSTRUMENTATION - OPTICAL CONTROL SYSTEMS PRECISION INSTRUMENTATION

Datasheet

📄 Open Download

Alternative Parts

Common REF5050IDR alternatives overseas buyers search for:

Compliance & Export Codes

TypeDetails
RoHSROHS3
ECCNEAR99
CNHTS8542399000
USHTS8542390001
TARIC8542399000
TypeDetails
CAHTS8542390000
BRHTS85423999
INHTS85423900
MXHTS8542.39.99

Sourcing Information

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